Ion Implantation and Other Applications of Ions
and Electrons

Kazimierz Dolny, Poland
June 18-21, 2018
ION 2018

You are cordially invited to participate in the XII-th International Conference "Ion Implantation and Other Applications of Ions and Electrons", ION 2018. The conference will be held in Kazimierz Dolny, Poland, from June 18 to June 21, 2018.

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List of Invited Speakers of the ION 2018 Conference

 

Piotr Budzyński, "Long range effect of ion implanted materials in tribological investigations", Lublin University of Technology, Lublin, Poland

 

Peter Gaiduk, "Self-organized nano-voids in irradiated SiGe/Si hetero-structures for plasmonic application", Belarussian State University, Minsk, Belarus

 

Reinhard Job, "Non-equilibrium conditions during light ion implantation", FH Münster, Germany

 

Bodo Kalkofen, "Solid sources deposited by Atomic Layer Deposition for doping of high aspect ratio semiconductor structures", Otto-von-Guericke-University Magdeburg, Germany

 

Jan Kruegener, "Ion implantation for photovoltaic applications: Review and outlook for n-type silicon solar cells", Leibniz Universität Hannover, Germany

 

Wilfried Lerch, "Advancement in Ion Implantation: Annealing from Seconds to Milliseconds". Technology consultant, Dornstadt, Germany

 

Sławomir Prucnal, "Towards group IV semiconductor laser", Helmholtz-Zentrum Dresden-Rossendorf, Germany

 

Alexander Scheit, "Flash Lamp Annealing for SiGe-HBT with FT=540GHz and Fmax=720GHz". Leibniz-Institut für Innovative Mikroelektronik, Frankfurt/Oder, Germany

 

Vladimir A. Skuratov, "High energy ionoluminescence of oxide and alkali halide crystals", Joint Institute for Nuclear Research, Dubna, Russia

 

Yang Tan, "Enhanced out-of-plane charge-transfer on a monolayer TMDCs by controlled defect creation: Optical Evidences in Heterostructure and Application for SERS", School of Physics, State Key Laboratory of Crystal Materials, Shandong University, Shandong, Jinan, China